Realization of next-generation semiconductor devices
Crystal Engineeering Laboratory
- Categories of technology seeds
- Nanotechnology･Materials
- keyword
- Chemical Mechanical Polishing、Silicon Carbide、Diamond、Gallium Nitride、Plasma Chemical Mechanical polishing、Plasma Chemical Vapor Deposition、Wide-bandgap semiconductor、
Faculty
AIDA Hideo
Mechanical system
Professor
- TEL：
- 0258-47-9734
- Detail
Specialties
Mechanical Engineering/Precision Machinery
Research areas
Our laboratory conducts research on “crystal processing” and “crystal growth” of semiconductor materials for the practical application of next-generation optoelectronics. Specifically, we are pursuing high-quality and high-speed processing technologies for gallium nitride and silicon carbide substrates, the next-generation semiconductor materials that are classified as difficult-to-process materials, and constructing a crystal growth process for diamond as a promising ultimate semiconductor material.
Main facilities
・Chemical Mechanical Polishing (CMP) machine
・Plasma CMP machine
・Conforcal Micro wave Plasma Chemical Vapor Deposition machine
・X-Ray Diffraction equipment
・Atomic Force Microscope
・Differential Interference Microscope
・Scanning Electron Microscope
Forte of this laboratory's study
・Ultra-precision machining of hard-to-process semiconductor materials
・Tracking evaluation of substrate fabrication processes
・Growth of single-crystal diamond crystals
・Real-time observation during crystal growth
